Junction Formation Dopants for Diffusion and Ion Implantation (Table 5)

Element Compound Formula State Technique
Antimony Antimony Trioxide Sb2O3 solid diffusion
  Antimony Trichloride SbCl3 liquid diffusion
Arsenic Arsenic Trioxide As2O3 solid diffusion
  Arsenic Trioxide As2O3
Ethyl Acetate
liquid diffusion - spin on
  Arsine AsH3 gas diffusion
ion implantation
  Arsenic Penta-fluoride AsF5 gas ion implantation
Phosphorus Phosphorus Pentoxide P2O5 solid diffusion
  Phosphorus Pentoxide P2O5
liquid diffusion - spin on
  Phosphorus Tribromide PBr3 liquid diffusion
  Phosphorus Trichloride PCl3 liquid diffusion
  Phosphorus Oxychloride POCl3 liquid diffusion
  Phosphine PH3 gas diffusion
ion implantation
  Phosphorus Pentafluoride PF5 gas ion implantation
Boron Boron Trioxide B2O3 solid diffusion
  Boron Nitride BN solid diffusion
  Boron Tribromide BBr3
Glycol ether
liquid diffusion
  Boron Trioxide B2O3 liquid diffusion - spin on
  Triethylborate B(COC2H5)3 liquid diffusion - spin on
  Silicon Tetrabromide SiBr4 liquid diffusion
  Boron Trichloride BCl3 liquid diffusion
ion implantation
  Boron Trifluoride BF3 gas ion implantation
  Diborane B2H6 gas diffusion
ion implantation
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