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Photoresist Strippers (Table 4)


Wet Chemical
  • Acid
    1. Sulfuric (H2SO4) and Chromic (CrO3)
    2. Sulfuric (H2SO4) and Ammonium Persulfate ((NH4)2S2O8)
    3. Sulfuric (H2SO4) and Hydrogen Peroxide (H2O2)
  • Organics
    1. Phenols, sulfonic acids, trichlorobenzene, perchloroethylene
    2. Glycol ethers, ethanolamine, triethanolamine
    3. Sodium hydroxide and silicates (positive resist)
Dry Chemical
  • Plasma Ashing (Stripping)
    1. RF (radio frequency) power source - 13.56 MHz frequency
    2. Oxygen (O2) source gas
    3. Oil lubricated vacuum pump system with liquid nitrogen trap
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