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Safety and Health Topics > Semiconductors > Silicon > Device Fabrication: Photoresist Stripping > Photoresist Strippers

Photoresist Strippers (Table 4)

Wet Chemical
Acid
  1. Sulfuric (H2SO4) and Chromic (CrO3)
  2. Sulfuric (H2SO4) and Ammonium Persulfate ((NH4)2S2O8)
  3. Sulfuric (H2SO4) and Hydrogen Peroxide (H2O2)
Organics
  1. Phenols, sulfonic acids, trichlorobenzene, perchloroethylene
  2. Glycol ethers, ethanolamine, triethanolamine
  3. Sodium hydroxide and silicates (positive resist)
Dry Chemical
Plasma Ashing (Stripping)
  1. RF (radio frequency) power source - 13.56 MHz frequency
  2. Oxygen (O2) source gas
  3. Oil lubricated vacuum pump system with liquid nitrogen trap
 
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