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Plasma Etching Gases and Etched Materials (Table 3)

Material Gas
Silicon  
Polysilicon (Si) and Silicon
CF + O2, CCL3 or CF3Cl, CF4 and HCl
Silicon Dioxide (SiO2)
C2F6, C3F8, CF4, SiF4, C5F12, CHF3,
CCl2F2, SF6, HF
Silicon Nitride (Si3N4)
CF4 + Ar, CF4 + O2, CF4 + H2
Metals  
Aluminum (Al)
CCl4 or BCl3 + He or Ar
Chromium (Cr)
CCl4
Chromium Oxide (CrO3)
Cl2 + Ar or CCl4 + Ar
Gallium Arsenide (GaAs)
CCl2F2
Vanadium (V)
Titanium (Ti)
Tantalum (Ta)
Molybdenum (Mo)
Tungsten (W)
CF4

 
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