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Safety and Health Topics > Semiconductors > Gallium Arsenide > Epitaxy: Reactor Cleaning

Epitaxy: Reactor Cleaning
After each growth cycle, the VPE reactors must be opened, the wafers removed, and the lower portion of the reactor physically cleaned. The EPI operator performs the cleaning process by scraping the lower quartz reactor and the base plate using a metal tool. The operator collects the particulate material (mixture of GaAs, GaAsP, arsenic oxides, phosphorous oxides, and entrapped hydride gases) in a metal container positioned below the vertical reactor, and uses a high-efficiency vacuum for the final cleanup.

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