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Safety and Health Topics > Semiconductors > Gallium Arsenide > Device Fabrication: Plasma Etching and Ashing Device Fabrication: Plasma Etching and Ashing As an alternative to wet etching, plasma etching and ashing are used. The reactor configurations and reactant gases are similar to those used in silicon device processing. (See Silicon Device Manufacturing - Device Fabrication - Etching and Photoresist Stripping)

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