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U.S. Department of Labor |
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| Occupational Safety & Health Administration | ||||||
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Semiconductors
> Gallium Arsenide
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Device Fabrication: Alloying
Device Fabrication: Alloying A final alloying step is performed in a low-temperature diffusion furnace, utilizing a nitrogen inert atmosphere. (See Silicon Device Manufacturing - Metallization - Alloying and Annealing) |
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